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Domestic or overseas Domestic Form of the I.P Patent
Patent no. US  16/581,922 Registration no. 11,359,968
Name of the invention APPARATUS AND METHOD FOR ADJUSTING INSTALLATION LOCATION OF TEMPERATURE SENSOR CONFIGURED TO MEASURE
Name of the invention(English) APPARATUS AND METHOD FOR ADJUSTING INSTALLATION LOCATION OF TEMPERATURE SENSOR CONFIGURED TO MEASURE
I.P sector Electronics
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Commercialization information

Commercialization information
I.P Abstract & Summary Disclosed herein is an apparatus for adjusting the installation location of a temperature sensor configured to measure the surface temperature of a wafer in a semiconductor wafer cleaning apparatus. The apparatus includes: a bracket which is disposed in the upper end of the side wall of each of multi-station processing chambers (MPCs); a first fastening member which fastens a cable; a second fastening member which fastens a temperature sensor; a location adjustment member which fastens and supports the temperature sensor; the temperature sensor which is fixedly coupled to an end of the location adjustment member; a jig which includes a location adjustment plate and a control substrate, and which adjusts the detection location of the temperature sensor; and a controller which is provided with a wafer surface monitoring system configured to separate the surface temperature into a plurality of channels and to display the surface temperature.
Trade type of the I.P Rights transfer ( Consultation )
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I.P stage R&D stage

#TEMPERATURE SENSOR, #SURFACE TEMPERATURE OF WAFER, #SEMICONDUCTOR WAFER CLEANING APPARATUS, #ADJUSTING INSTALLATION LOCATION